Monday, May 12

4:30 PM-6:10 PM
Peale A Room

Stress Effects in Thin Films

Stressed solid bilayers such as epitaxial films form a basis for electronic and optoelectronic devices. While the presence of stresses in these thin film systems is responsible for enhanced device properties, the stresses also control the morphology of the film and determine the formation of defects. In the interest of furthering thin film technologies, there is a need to understand the interplay of stresses, morphology development and defect formation in stressed thin films. The speakers in this minisymposium will discuss recent progress in this area. Topics to be addressed include stress-induced film morphologies, the formation of dislocations, the use of continuum and atomistic models of thin films, film/substrate wetting effects, instabilities of nonplanar morphologies, and the use of compliant substrates to mitigate defect formation.

Organizer: Brian J. Spencer
State University of New York, Buffalo

4:30-4:50 Atomistic and Continuum Modeling of Dislocation Formation in Thin Films
Huajian Gao, Stanford University
4:55-5:15 The Mechanics of Strained Thin Films on Compliant Substrates
L. B. Freund, Brown University
5:20-5:40 Equilibrium Shapes of Islands in Strained Solid Films
Brian Spencer, Organizer; and Jerry Tersoff, IBM T. J. Watson Research Center
5:45-6:05 Morphological Instabilities and Evolution of Thin Films
Harris Wong, Peter W. Voorhees, Michael J. Miksis, and Stephen H. Davis, Northwestern University

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MMD, 12/17/96