Editorial Board


Michael Elad
Technion - Israel Institute of Technology

Associate Editors

Luis Alvarez
Universidad De Las Palmas
Jean-Francois Aujol
Universite Bordeaux I
Andrea L. Bertozzi
University of California, Los Angeles
Jose M. Bioucas-Dias
Instituto Superior Tecnico
Charles A. Bouman
Purdue University
David J. Brady
Duke University
Alexander Bronstein
Technion - Israel Institute of Technology
Michael M. Bronstein
Universita Della Svizzera Italiana
Robert Calderbank
Duke University
Antonin Chambolle
Ecole Polytechnique
Subhasis Chaudhuri
Indian Institute of Technology Bombay
Frederic Chazal
INRIA Saclay Ile-de-France - SAF
Rama Chellappa
University of Maryland
Bartomeu Coll
University of Balearic Islands
Patrick L. Combettes
North Carolina State University
Daniel Cremers
Technical University Munich
Weisheng Dong
Xidian University
Adel Faridani
Oregon State University
Mario Figueiredo
Instituto de Telecomunicacoes (IT)
Alessandro Foi
Tampere University of Technology
Alejandro F. Frangi
University of Leeds
Peter Kuchment
Texas A&M University
Gitta Kutyniok
Technische Universitaet Berlin
Qing H. Liu
Duke University
Jean-Michel Morel
Ecole Normale Super de Cachan
Deanna Needell
University of California, Los Angeles
Michael Ng
Hong Kong Baptist University
Michael Ng
Hong Kong Baptist University
Mads Nielsen
University of Copenhagen
Gabriel Peyré
Universite De Paris-Dauphine
Thomas Pock
Technische Universitaet Graz
Konrad Polthier
Freie Universitaet Berlin
Martin Rumpf
Universitaet Bonn
Guillermo Sapiro
Duke University
Otmar Scherzer
University of Vienna
Christoph Schnoerr
University of Heidelberg
Gabriele Steidl
Kaiserslautern University
Thomas Strohmer
University of California, Davis
Xue Cheng Tai
Hong Kong Baptist University
Chrysoula Tsogka
University of Crete
Dimitri Van De Ville
Ecole Polytechnique Federale De Lausanne
René Vidal
Johns Hopkins University
Joachim Weickert
Saarland University
Rebecca Willett
University of Chicago
Lei Zhang
Hong Kong Polytechnic University

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