Wednesday, May 24
MS29
Epitaxial Growth - Part IV of IV
10:00 AM-12:00 PM
Room: Liberty C
For description, see Part I, MS8; for Parts II and III, see MS15 and MS22, respectively.
Organizers: Robert V. Kohn
Courant Institute of Mathematical Sciences, New York University, USA
George Gilmer
Bell Laboratories, Lucent Technologies, USA
- 10:00-10:20 A Continuum Model of Kinetic Roughening and Coarsening in Thin Films
- Michael Ortiz, Kaushik Bhattacharya, Yichung Shu and Eduardo A. Repetto California Institute of Technology, USA
- 10:25-10:45 Topography Simulation, Level Sets, Atomistics and Perspectives from Industry
- Peter O'Sullivan, F. Baumann, G. Gilmer, and J. Dalla Torre, Bell Laboratories, Lucent Technologies, USA
- Cancelled
10:50-11:10 Level Set Issues for the Island Dynamics Model
Russel Caflisch and Susan Chen, University of California, Los Angeles, USA; Mark Gyure, HRL Laboratories, USA; Myungjoo Kang, Barry Merriman, Stan Osher, and Christian Ratsch, University of California, Los Angeles, USA
- 10:50-11:10 Reversibility in Level Set Methods
- Max Peterson, University of California, Los Angeles, USA
- 11:15-11:35 Etching and Deposition using Level Set Methods
- David Adalsteinsson, University of North Carolina, Chapel Hill, USA
- 11:40-12:00 Modeling MOCVD Growth of YBCO Thin Films
- Tak Shing Lo, Courant Institute of Mathematical Sciences, New York University, USA; and Robert V. Kohn, Organizer